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1

SPIE Proceedings [SPIE SPIE Optical Systems Design - Marseille, France (Monday 5 September 2011)] Optical Design and Engineering IV - Simulation tools for advanced mask aligner lithography

Bramati, Arianna, Vogler, Uwe, Meliorisz, Balint, Motzek, Kristian, Hornung, Michael, Voelkel, Reinhard

Year:

2011

Language:

english

File:

PDF, 686 KB

english, 2011

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - Modeling and parameter tuning for templated directed self-assembly

Bencher, Christopher, Cheng, Joy Y., Meliorisz, B., Mülders, T., Stock, H.-J., Marokkey, S., Demmerle, W., Lai, K., Raghunathan, A., Dhagat, P.

Year:

2016

Language:

english

File:

PDF, 1.33 MB

english, 2016

3

Investigation of high-resolution contact printing

B. Meliorisz, S. Partel, T. Schnattinger, T. Fühner, A. Erdmann, P. Hudek

Journal:

Microelectronic Engineering

Year:

2008

Language:

english

File:

PDF, 782 KB

english, 2008

4

Optimization of illumination pupils and mask structures for proximity printing

K. Motzek, A. Bich, A. Erdmann, M. Hornung, M. Hennemeyer, B. Meliorisz, U. Hofmann, N. Ünal, R. Voelkel, S. Partel, P. Hudek

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 515 KB

english, 2010

5

Computational algorithms for optimizing mask layouts in proximity printing

K. Motzek, U. Vogler, M. Hennemeyer, M. Hornung, R. Voelkel, A. Erdmann, B. Meliorisz

Journal:

Microelectronic Engineering

Year:

2011

Language:

english

File:

PDF, 613 KB

english, 2011

6

Simulation of proximity and contact lithography

Bálint Meliorisz, Peter Evanschitzky, Andreas Erdmann

Journal:

Microelectronic Engineering

Year:

2007

Language:

english

File:

PDF, 268 KB

english, 2007

7

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Increasing the predictability of AIMS measurements by coupling to resist simulations

Meliorisz, Balint, Erdmann, Andreas, Schnattinger, Thomas, Ströβner, Ulrich, Scherübl, Thomas, De Bisschop, Peter, Philipsen, Vicky, Horiuchi, Toshiyuki

Year:

2008

Language:

english

File:

PDF, 893 KB

english, 2008

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Emerging Patterning Technologies - Advanced fast 3D DSA model development and calibration for design technology co-optimization

Bencher, Christopher, Cheng, Joy Y., Lai, Kafai, Meliorisz, Balint, Muelders, Thomas, Welling, Ulrich, Stock, Hans-Jürgen, Marokkey, Sajan, Demmerle, Wolfgang, Liu, Chi-Chun, Chi, Cheng, Guo, Jing

Year:

2017

Language:

english

File:

PDF, 2.78 MB

english, 2017